TUT and Haaga Helia Honour Mentors for Hard Work and Dedication. Haaga-Helia University of Applied Science and Tshwane University of Technology recently honoured and celebrated mentors who contributed to the success of their mutually beneficial mentorship program.
The TUT and Haaga-Helia University of Applied Sciences launched a mentoring programme in 2020 that transcended physical boundaries in response to the global COVID-19 pandemic. When travel restrictions and safety concerns made traditional face-to-face staff development programmes unfeasible, this partnership evolved.
TUT and Haaga Helia Honour Mentors for Hard Work and Dedication
A Capacity Development Programme was established as a result of this agreement which aimed to enhance both institutions’ educational experience and skills. Prof Ben van Wyk, Vice-Chancellor for Teaching and Learning, noted: “This partnership has evolved over the years and culminated in a remarkable achievement in 2023.”
TUT and Haaga-Helia mentors who were honoured for their hard work and dedication.
According to Prof van Wyk, the partnership’s impact has grown significantly since it launched the mentorship program.
There have been 380 graduates who have successfully completed the mentorship program so far. As Prof van Wyk noted, “the growth of both institutions is a testament to mentorship, but also to their commitment to encouraging academic and professional development.”
As part of the program, partnerships have been established with the University of Mpumalanga (UMP) and the Cape Peninsula University of Technology (CPUT) in addition to TUT and Haaga-Helia. Mentorship has been enriched by these local collaborators, whose support has been crucial in broadening its reach and impact.
Through the University Capacity Development Program (UCDP), the Department of Higher Education and Training (DHET) has also recognized the importance of this initiative.
For more information on the Tshwane University of Technology, please contact Phaphama Tshisikhawe, Corporate Affairs and Marketing.
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